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Search for: [Abstrakt = "Stress measurements of 23 nm copper films and 93 nm silver films on Si \(100\) have been performed during thermal cycling between RT and 450°C. The changes in stress versus temperature are interpreted. The effects of treatment on microstructure and composition are studied by X\-ray diffraction."]

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Optica Applicata

Proszyński, Adam Chocyk, Dariusz Gładyszewski, Grzegorz Pieńkos, Tomasz Gładyszewski, Longin Gaj, Miron. Redakcja Wilk, Ireneusz. Redakcja

2005
artykuł

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