@misc{Luo_Ningning_Real-time_2010,
 author={Luo, Ningning and Gao, Yiqing and Chen, Min and Yu, Lixia and Ye, Qing},
 contributor={Gaj, Miron. Redakcja and Urbańczyk, Wacław. Redakcja},
 year={2010},
 rights={Wszystkie prawa zastrzeżone (Copyright)},
 publisher={Oficyna Wydawnicza Politechniki Wrocławskiej},
 description={Optica Applicata, Vol. 40, 2010, nr 1, s. 239-248},
 language={eng},
 abstract={Digital lithography technique is a promising tool for the fabrication of binary optical element. In this paper, we present the mask-division technique to improve the lithography quality. A piece of high-frequency mask is divided into several pieces of low-frequency binary masks. Then they are imaged on the photoresist successively by using the DMD-based lithography system. Based on the theory of partial coherent light, the intensity distribution in image plane has been simulated. The grating masks with period of 4 μm have been fabricated by using the mask-division technique. Experimental results demonstrate the feasibility of the proposed method as an effective technique for advancing the edge sharpness.},
 title={Real-time mask-division technique based on DMD digital lithography},
 type={artykuł},
 keywords={optyka, digital lithography technique, mask-division technique, DMD-based lithography, edge sharpness},
}