@misc{Changshi_Liu_Influence_2005, author={Changshi, Liu}, contributor={Gaj, Miron. Redakcja and Wilk, Ireneusz. Redakcja}, year={2005}, rights={Wszystkie prawa zastrzeżone (Copyright)}, publisher={Oficyna Wydawnicza Politechniki Wrocławskiej}, description={Optica Applicata, Vol. 35, 2005, nr 2, s. 409-413}, language={eng}, abstract={The intensive distribution of photoelectrons as a function of X-ray beam with variable angle of incidence was investigated. Diffraction caused by the structure of surface was observed in the following metal samples: Al with face-centered cube, Ta and W with body-centered cubes. No effect was observed in Fe and Cu samples. The effect is closely related to the anode high voltages and X-ray energy. There was a range of threshold values in which the surface structure effects could be defined in experimental high voltages of anode. The possible mechanism of this effect was discussed.}, title={Influence of metal surface structure on the anisotropic XPS}, type={artykuł}, keywords={optyka, high voltage of anode, structure of surface, X-ray photoelectron spectroscopy (XPS)}, }