The impact of the light exposure on the morphological properties of selected photoresists - Sikora, Andrzej; Janus, Paweł; Sierakowski, Andrzej (Oficyna Wydawnicza Politechniki Wrocławskiej, 2019)
Optica Applicata, Vol. 49, 2019, nr 1, s. 177-185
Keywords: optyka; photolitography; polymer degradation; atomic force microscopy (AFM)