Improvement of the electron beam lithography contact pads fabrication process - Indykiewicz, Kornelia; Paszkiewicz, Regina; Paszkiewicz, Bogdan (Oficyna Wydawnicza Politechniki Wrocławskiej, 2016)
Optica Applicata, Vol. 46, 2016, nr 2, s. 249-254
Keywords: optyka; electron beam lithography (EBL); exposition of big areas; exposition time optimization