TY - GEN N1 - Optica Applicata, Vol. 40, 2010, nr 1, s. 239-248 N2 - Digital lithography technique is a promising tool for the fabrication of binary optical element. In this paper, we present the mask-division technique to improve the lithography quality. A piece of high-frequency mask is divided into several pieces of low-frequency binary masks. Then they are imaged on the photoresist successively by using the DMD-based lithography system. Based on the theory of partial coherent light, the intensity distribution in image plane has been simulated. The grating masks with period of 4 μm have been fabricated by using the mask-division technique. Experimental results demonstrate the feasibility of the proposed method as an effective technique for advancing the edge sharpness. L1 - http://dbc.wroc.pl/Content/58244/optappl_4001p239.pdf M3 - artykuł L2 - http://dbc.wroc.pl/Content/58244 PY - 2010 KW - optyka KW - digital lithography technique KW - mask-division technique KW - DMD-based lithography KW - edge sharpness C1 - Wszystkie prawa zastrzeżone (Copyright) A1 - Luo, Ningning A1 - Gao, Yiqing A1 - Chen, Min A1 - Yu, Lixia A1 - Ye, Qing A2 - Gaj, Miron. Redakcja A2 - Urbańczyk, Wacław. Redakcja PB - Oficyna Wydawnicza Politechniki Wrocławskiej C6 - Dla wszystkich w zakresie dozwolonego użytku LA - eng CY - Wrocław T1 - Real-time mask-division technique based on DMD digital lithography UR - http://dbc.wroc.pl/dlibra/publication/edition/58244 ER -