Group publication title:
Subject and Keywords:
Optica Applicata, Vol. 39, 2009, nr 3, s. 459-465
This research focused on polish characteristic of polymer based waveguides. The aim of the research was to show how polishing parameters affect the cut length of the end surface of SU-8 polymer on silicon and to detemine the best parameters for polishing SU-8 polymer. Then, four samples were used for characterizing the polishing of polymer. Each sample was polished with the same rotation and sandpaper size but with different rotational speed. The experiment result shows that the best rotational speed for polishing polymer SU-8 sample on silicon is 200 rpm.