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Title:

Properties of AlNx thin films prepared by DC reactive magnetron sputtering

Group publication title:

Optica Applicata

Creator:

Stafiniak, Andrzej ; Muszyńska, Donata ; Szyszka, Adam ; Paszkiewicz, Bogdan ; Ptasiński, Konrad ; Patela, Sergiusz ; Paszkiewicz, Regina ; Tłaczała, Marek

Contributor:

Gaj, Miron. Redakcja ; Urbańczyk, Wacław. Redakcja

Subject and Keywords:

optyka ; aluminum nitride (AlN) ; thin films ; reactive magnetron sputtering ; alternative dielectrics

Description:

Optica Applicata, Vol. 39, 2009, nr 4, s. 717-722

Abstrakt:

In this paper, the results of investigation of the influence of cathode current on optical and dielectric AlNx thin-film properties are presented. AlNx films were prepared by pulsed DC reactive magnetron sputtering of Al target on substrates at room temperature. For characterization of fabricated test structures C-V spectroscopy, ellipsometry measurement and atomic force microscopy (AFM) were used.

Publisher:

Oficyna Wydawnicza Politechniki Wrocławskiej

Place of publication:

Wrocław

Date:

2009

Resource Type:

artykuł

Source:

<sygn. PWr A3481II> ; click here to follow the link ; click here to follow the link

Language:

eng

Relation:

Optica Applicata ; Optica Applicata, Vol. 39, 2009 ; Optica Applicata, Vol. 39, 2009, nr 4 ; Politechnika Wrocławska. Wydział Podstawowych Problemów Techniki

Rights:

Wszystkie prawa zastrzeżone (Copyright)

Access Rights:

Dla wszystkich w zakresie dozwolonego użytku

Location:

Politechnika Wrocławska