Show structure

Title:

(100) GaAs surface treatment prior to contact metal deposition in AlGaAs/GaAs quantum cascade laser processing

Group publication title:

Optica Applicata

Creator:

Papis, Ewa ; Barańska, Anna ; Karbownik, Piotr ; Szerling, Anna ; Wójcik-Jedlińska, Anna ; Bugajski, Maciej ; Rzodkiewicz, Witold ; Szade, Jacek ; Wawro, Andrzej

Subject and Keywords:

optyka ; GaAs ; surface treatment ; sputter etching

Description:

Optica Applicata, Vol. 39, 2009, nr 4, s. 787-797

Publisher:

Oficyna Wydawnicza Politechniki Wrocławskiej

Place of publication:

Wrocław

Contributor:

Gaj, Miron. Redakcja ; Urbańczyk, Wacław. Redakcja

Date:

2009

Resource Type:

artykuł

Source:

<sygn. PWr A3481II> ; click here to follow the link ; click here to follow the link

Language:

eng

Relation:

Optica Applicata ; Optica Applicata, Vol. 39, 2009 ; Optica Applicata, Vol. 39, 2009, nr 4 ; Politechnika Wrocławska. Wydział Podstawowych Problemów Techniki

Location:

Politechnika Wrocławska

Abstrakt:

The effects of HCl-based chemical and Ar+ sputter etching treatment on (100) GaAs surface properties with the aim to develop the procedure of surface preparation before metal deposition have been investigated. Variable angle spectroscopic ellipsometry, X-ray photoelectron spectroscopy, atomic force microscopy and photoluminescence have been used to study the surface characterization. We show that combining chemical etching in 5% HCl with Ar+ sputter etching gives the best results for surface cleaning prior to metal deposition. The application of this two-step treatment allows to obtain Ni/AuGe/Ni/Au ohmic contact with rc = 2×10–6 Ωcm2 with excellent adhesion and long-term thermal stability.

Rights:

Wszystkie prawa zastrzeżone (Copyright)

Access Rights:

Dla wszystkich w zakresie dozwolonego użytku