Title:

Mitigation of scale problem in the pumped Disi water to Amman, Jordan

Group publication title:

Environment Protection Engineering

Creator:

Al-Maabreh, Alaa M. ; Al-Rawajfeh, Aiman Eid ; Alshamaileh, Ehab ; Al-Bazedi, G. A.

Contributor:

Majewska-Nowak, Katarzyna Maria. Redakcja

Subject and Keywords:

ochrona środowiska ; inżynieria środowiska

Description:

Environment Protection Engineering. Vol. 45, 2019, nr 1, s. 97-110

Abstrakt:

Various methods are known to mitigate or prevent scale formation in pipes, rather by chemical addition, e.g., anti-scaling substances, or physically which includes ultrasonic or nanofiltration (NF). Nanofiltration membranes have a selectivity for the multivalent charged ions, so monovalent ions will pass the membrane partly and multivalent ions will be rejected completely. Chemical addition to prevent scale formation is based on justifying water parameters such as pH, alkalinity, and concentrations of ions that form the building units of scale crystal. In order to mitigate the scaling tendency in water pumped from the Disi aquifer to Amman city along its 345 km pipeline, different studies were conducted using simulated plumbing system. This part of the study is concerned with scale mitigation using nanofiltration and addition of chemicals. Nanofiltration was applied to reduce the hardness that causes scale deposition where it rejected around 70.5% of Ca2+, 71.98% Mg2+, 7.72% K+, 29.0% Na+, 66.63% Cl–, 86.51% NO3 – , 85.72% SO4 2–, and 69.85% CO2. Increasing the concentration of some ions such as Na+, K+ and Cl– keeping the allowable limit gave good results for scale mitigation.

Publisher:

Oficyna Wydawnicza Politechniki Wrocławskiej

Place of publication:

Wrocław

Date:

2019

Resource Type:

artykuł

Resource Identifier:

doi:10.5277/epe190108

Source:

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Language:

eng

Relation:

Environment Protection Engineering ; Environment Protection Engineering. Vol. 45, 2019 ; Environment Protection Engineering. Vol. 45, 2019, nr 1

Rights:

Wszystkie prawa zastrzeżone (Copyright)

Access Rights:

Dla wszystkich w zakresie dozwolonego użytku

Location:

Politechnika Wrocławska