Title:
Linewidth control by overexposure in laser lithography
Group publication title:
Creator:
Yiyong, Liang ; Guoguang, Yang
Subject and Keywords:
optyka ; linewidth ; overexposure ; laser lithography
Description:
Optica Applicata, Vol. 38, 2008, nr 2, s. 399-404
Publisher:
Oficyna Wydawnicza Politechniki Wrocławskiej
Place of publication:
Contributor:
Gaj, Miron. Redakcja ; Urbańczyk, Wacław. Redakcja
Date:
Resource Type:
Source:
<sygn. PWr A3481II> ; click here to follow the link ; click here to follow the link
Language:
Relation:
Optica Applicata ; Optica Applicata, Vol. 38, 2008 ; Optica Applicata, Vol. 38, 2008, nr 2 ; Politechnika Wrocławska. Wydział Podstawowych Problemów Techniki
Location:
Abstrakt:
In micro-electronic and micro-optical manufacturing, especially in the fabrication of linewidth-variation-sensitive devices, we sometimes care getting stable or precise linewidth rather than creating a thinner line. In laser lithography, the energy distribution of a focused laser spot is of Gaussian form, and the modification of an exposure dose or exposure threshold will cause linewidth variation. If the peak of energy distribution of a laser spot is a little higher than the exposure threshold of a photoresist layer, the produced linewidth may be small but unstable, and if the peak is considerably higher than the threshold, in other words in the case of overexposure, the linewidth will be relatively stable. The test was carried out in a polar laser lithographic system through a continuously changing exposure dose. The experimental result shows that the dose-induced linewidth variation velocity is different under a variant exposure dose. The higher the exposure dose, the lower the linewidth variation velocity.
Rights:
Wszystkie prawa zastrzeżone (Copyright)