Object
Title: Metrology of Mo/Si multilayer mirrors at 13.5 nm with the use of a laser-produced plasma extreme ultraviolet (EUV) source based on a gas puff target
Creator:
Rakowski, R. ; Bartnik, A. ; Fiedorowicz, H. ; Jarocki, R. ; Kostecki, J. ; Krzywiński, J. ; Mikołajczyk, J. ; Pina, L. ; Ryc, L. ; Szczurek, M. ; Ticha, H. ; Wachulak, P.
Contributor:
Gaj, Miron. Redakcja ; Wilk, Ireneusz. Redakcja
Description:
Optica Applicata, Vol. 36, 2006, nr 4, s. 593-600
Abstrakt:
In this paper an application of a recently developed laser plasma source of extreme ultraviolet (EUV) for optical measurements of optical characteristics of Mo/Si multilayer mirrors is presented. The source is based on an xenon-helium double-stream gas puff target irradiated with laser pulses from a Nd : YAG laser system (E = 0.55 J, t = 3.9 ns, f = 10 Hz, M 2 = 2.5). The results show that the source can be useful for EUV lithography technologies as a metrology tool in the semiconductor industry.
Publisher:
Oficyna Wydawnicza Politechniki Wrocławskiej
Place of publication:
Date:
Resource Type:
Resource Identifier:
Source:
<sygn. PWr A3481II> ; click here to follow the link ; click here to follow the link
Language:
Relation:
Optica Applicata ; Optica Applicata, Vol. 36, 2006 ; Optica Applicata, Vol. 36, 2006, nr 4 ; Politechnika Wrocławska. Wydział Podstawowych Problemów Techniki
Rights:
Wszystkie prawa zastrzeżone (Copyright)
Access Rights:
Dla wszystkich w zakresie dozwolonego użytku
Location:
Object collections:
- Dolnośląska Biblioteka Cyfrowa > Uczestnicy Konsorcjum > 01. Politechnika Wrocławska > Czasopisma > Wydane w PWr > Optica Applicata
- Dolnośląska Biblioteka Cyfrowa > Zasoby > 2. Czasopisma > Czasopisma współczesne
- Dolnośląska Biblioteka Cyfrowa > Dziedziny nauki > 6. Nauki ścisłe i przyrodnicze
Last modified:
Apr 6, 2019
In our library since:
Apr 6, 2019
Number of object content hits:
9
All available object's versions:
https://dbc.wroc.pl/publication/118373
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Optica Applicata
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Optica Applicata, Vol. 1, 1971
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Optica Applicata, Vol. 2, 1972
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Optica Applicata, Vol. 3, 1973
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Optica Applicata, Vol. 16, 1986
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Optica Applicata, Vol. 17, 1987
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Optica Applicata, Vol. 18, 1988
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Optica Applicata, Vol. 19, 1989
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Optica Applicata, Vol. 20, 1990
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Optica Applicata, Vol. 23, 1993
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Optica Applicata, Vol. 25, 1995
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Optica Applicata, Vol. 26, 1996
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Optica Applicata, Vol. 27, 1997
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Optica Applicata, Vol. 28, 1998
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Optica Applicata, Vol. 29, 1999
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Optica Applicata, Vol. 31, 2001
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Optica Applicata, Vol. 32, 2002
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Optica Applicata, Vol. 33, 2003
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Optica Applicata, Vol. 34, 2004
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Optica Applicata, Vol. 35, 2005
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Optica Applicata, Vol. 36, 2006
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Optica Applicata, Vol. 36, 2006, nr 1
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Optica Applicata, Vol. 36, 2006, nr 2-3
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Optica Applicata, Vol. 36, 2006, nr 4
- High pressure spectroscopy of Pr3+ doped KLa(MoO4)2 crystal
- Spectroscopy of Cd2 and Zn2 molecules in free-jet supersonic beams: experimental and theoretical studies
- Sensitive detection of NO2 with cavity enhanced spectroscopy
- The 61Πu state of Na2 molecule
- Anomalous broadening of DMABN electronic spectra in solutions
- The temporal dipole moments of solute molecules undergoing charge transfer
- Investigation of collisions between electrons and excited atoms of potassium, rubidium and caesium
- Investigation of a highly excited electronic 1Π state of NaLi molecule
- Excited 1u(51P1) state of Cd2 and the dipole moment of the 1u(51P1)–X0g+ electronic transition
- Exotic states of diatomic molecules and methods of their description
- Rotation of PRODAN in excited state
- Hyperfine structure and isotope shifts in 461.9 nm forbidden line of Pb I
- The E2 admixture in mixed multipole line 647.6 nm in the spectrum of Bi I
- Electron-scattering total cross sections for triatomic molecules: NO2 and H2O
- Measurements of inelastic electron scattering from molecular oxygen at high scattering angles
- A system for magnetooptical cooling and trapping of Rb atoms
- Stark effect in He I in extremely high electric field
- Can a variational approach describe pulse splitting in a dispersion managed system?
- A way to the engineering of the quantum states of trapped ions – report of work in progress
- Ab initio study of formic acid monomer, dimer and trimer
- Metrology of Mo/Si multilayer mirrors at 13.5 nm with the use of a laser-produced plasma extreme ultraviolet (EUV) source based on a gas puff target
- Examination and optical correction of the vision system following the procedure of cataract removal
- Spectral optical coherence tomography for nondestructive examinations
- Investigation of atmospheric aerosol with multiwavelength lidar
- Studies of aerosol physical properties in the coastal area
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Optica Applicata, Vol. 36, 2006, nr 1
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Optica Applicata, Vol. 37, 2007
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Optica Applicata, Vol. 38, 2008
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Optica Applicata, Vol. 39, 2009
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Optica Applicata, Vol. 40, 2010
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Optica Applicata, Vol. 41, 2011
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Optica Applicata, Vol. 42, 2012
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Optica Applicata, Vol. 43, 2013
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Optica Applicata, Vol. 44, 2014
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Optica Applicata, Vol. 45, 2015
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Optica Applicata, Vol. 46, 2016
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Optica Applicata, Vol. 47, 2017
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Optica Applicata, Vol. 1, 1971
