Object

Title: Influence of high Al fraction on reactive ion etching of AlGaN/GaN heterostructures

Object collections:

Last modified:

16 sty 2019

In our library since:

20 lis 2018

Number of object content hits:

109

Number of object content views in PDF format

134

All available object's versions:

https://dbc.wroc.pl/publication/87642

Show description in RDF format:

RDF

Show description in OAI-PMH format:

OAI-PMH

Objects Similar

×

Citation

Citation style:

This page uses 'cookies'. More information