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Linewidth control by overexposure in laser lithography

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Title: Linewidth control by overexposure in laser lithography

Creator:

Yiyong, Liang ; Guoguang, Yang

Contributor:

Gaj, Miron. Redakcja ; Urbańczyk, Wacław. Redakcja

Description:

Optica Applicata, Vol. 38, 2008, nr 2, s. 399-404

Abstrakt:

In micro-electronic and micro-optical manufacturing, especially in the fabrication of linewidth-variation-sensitive devices, we sometimes care getting stable or precise linewidth rather than creating a thinner line. In laser lithography, the energy distribution of a focused laser spot is of Gaussian form, and the modification of an exposure dose or exposure threshold will cause linewidth variation. If the peak of energy distribution of a laser spot is a little higher than the exposure threshold of a photoresist layer, the produced linewidth may be small but unstable, and if the peak is considerably higher than the threshold, in other words in the case of overexposure, the linewidth will be relatively stable. The test was carried out in a polar laser lithographic system through a continuously changing exposure dose. The experimental result shows that the dose-induced linewidth variation velocity is different under a variant exposure dose. The higher the exposure dose, the lower the linewidth variation velocity.

Publisher:

Oficyna Wydawnicza Politechniki Wrocławskiej

Place of publication:

Date:

Resource Type:

Resource Identifier:

oai:dbc.wroc.pl:62879

Source:

<sygn. PWr A3481II> ; click here to follow the link ; click here to follow the link

Language:

Relation:

Optica Applicata ; Optica Applicata, Vol. 38, 2008 ; Optica Applicata, Vol. 38, 2008, nr 2 ; Politechnika Wrocławska. Wydział Podstawowych Problemów Techniki

Rights:

Wszystkie prawa zastrzeżone (Copyright)

Access Rights:

Dla wszystkich w zakresie dozwolonego użytku

Location:

Politechnika Wrocławska

Group publication title:

Optica Applicata

Subject and keywords:

optyka linewidth overexposure laser lithography

Object collections:

Last modified:

Mar 22, 2019

In our library since:

Mar 22, 2019

Number of object content hits:

273

All available object's versions:

https://dbc.wroc.pl/publication/114239

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Optica Applicata

Edition name	Date
Linewidth control by overexposure in laser lithography	Mar 22, 2019

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