Object

Title: Photoluminescence study of Nd3+-doped Si-rich silica films

Creator:

Breard, David ; Gourbilleau, Fabrice ; Belarouci, Ali ; Dufour, Christian ; Rizk, Richard

Contributor:

Gaj, Miron. Redakcja ; Wilk, Ireneusz. Redakcja

Description:

Optica Applicata, Vol. 36, 2006, nr 2-3, s. 187-192

Abstrakt:

Nd3+-doped silicon-rich silicon oxide thin films have been fabricated by reactive magnetron co-sputtering of a pure silica target topped with Nd2O3 chips. The incorporation of silicon excess in the films has been controlled by the hydrogen partial pressure PH2 introduced in the plasma. Photoluminescence experiments have been made at room temperature using a non resonant excitation with Nd3+ ions. The influences of Nd3+ content and PH2 have been studied to improve the Nd3+ emission. Photoluminescence spectra reveal an enhancement of the Nd3+ emission at 0.9 mm and 1.1 mm when silicon nanoclusters and Nd3+ are embedded in a SiO2 matrix.

Publisher:

Oficyna Wydawnicza Politechniki Wrocławskiej

Place of publication:

Wrocław

Date:

2006

Resource Type:

artykuł

Resource Identifier:

oai:dbc.wroc.pl:63571

Source:

<sygn. PWr A3481II> ; click here to follow the link ; click here to follow the link

Language:

eng

Relation:

Optica Applicata ; Optica Applicata, Vol. 36, 2006 ; Optica Applicata, Vol. 36, 2006, nr 2-3 ; Politechnika Wrocławska. Wydział Podstawowych Problemów Techniki

Rights:

Wszystkie prawa zastrzeżone (Copyright)

Access Rights:

Dla wszystkich w zakresie dozwolonego użytku

Location:

Politechnika Wrocławska

Group publication title:

Optica Applicata

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